Rohm is moving to internalize gallium nitride (GaN) epitaxy, a critical production step for GaN power semiconductors, by deploying Aixtron’s G10-GaN platform. The Japanese semiconductor group aims to strengthen its supply chain control and boost manufacturing capacity in response to accelerating demand from artificial intelligence infrastructure and electric vehicle markets.
The G10-GaN system, from German equipment supplier Aixtron, enables high-volume epitaxial wafer production. By bringing this process in-house, Rohm shifts from relying on external foundries for epitaxy, a transition that follows the acquisition of a license from a foundry partner [article truncated]. Tighter integration is expected to improve production efficiency, quality oversight, and scalability.
The strategy positions Rohm to capture growth in AI data center power supplies and EV powertrains, where GaN components are valued for their high efficiency and power density. The move reflects a broader industry push toward vertical integration in compound semiconductor manufacturing to mitigate bottlenecks and better align output with surging end-market demand.