CEA-Leti平台为芯片制造商提供纳米尺度应变映射。

CEA-Leti Platform Offers Chipmakers Nanometre- Scale Strain Mapping

CEA-Leti Original
摘要
CEA-Leti 推出应变映射服务,利用透射电子显微镜(TEM)旋进电子衍射(PED)以约1纳米空间分辨率和0.02%精度测量芯片晶格变形。该服务已部署在三台TEM上,提高了样品处理量和周转速度,使更多研究人员能够使用。Bernier 强调基础研究与应用工程团队的合作将这一实验方法转化为常规表征服务,增强了先进微电子器件的纳米尺度计量能力。

先进微电子器件的性能很大程度上取决于电荷的高效输运,而电荷输运性质又与晶体晶格的变形密切相关。应变工程通过刻意拉伸或压缩晶格来提升电子流动速度,即使晶格间距仅发生不到百分之一的变化,也能带来更快、更节能的处理器。正因如此,CEA-Leti 近年来一直专注于对材料变形进行局部、定量测量,这已成为当前尖端器件的核心需求之一。

CEA-Leti 推出的应变映射服务采用透射电子显微镜(TEM)结合旋进电子衍射(PED)技术。传统电子衍射中,电子束以固定角度照射晶体,动态散射常导致复杂的衍射图案;而 PED 让电子束沿圆锥轨迹旋转扫描,在数十个取向上记录更完整的衍射信息,从而获得更高质量的衍射数据,并进一步转化为应变分布图。

具体流程上,首先利用聚焦离子束(FIB)研磨制备约 80 纳米厚的超薄芯片截面样品,然后将其放入配备 PED 模块的 TEM 中。扫描衍射使实验室能够以高空间分辨率测量器件不同区域的晶格参数。该技术可提供空间分辨率 1 纳米、精度约 0.02% 的应变图,使 CEA-Leti 跻身全球纳米计量领域的领先行列。此外,该方法已在可能范围内简化和加速,以提高通量并更高效地利用设备,从而缩短表征请求的周转时间。目前已有三台 TEM 配备 PED 测量能力,使 CEA-Leti 能够处理更多样品,并向更多合格的显微分析人员开放该服务。

Bernier 强调,团队成员的组合专业知识是这一成果的关键。基础研究与应用驱动工程之间的合作,将一项实验性方法转化为实用、常规的表征服务,为先进微电子器件的应变工程提供了可靠的计量支撑。

Summary
CEA-Leti has developed a strain-mapping service using transmission electron microscopy with precession electron diffraction, delivering nanoscale deformation maps with 1 nm spatial resolution and about 0.02% precision. Team member Bernier highlighted the combined fundamental and applied expertise behind the method, and three equipped TEMs now enable faster turnaround and higher sample throughput for advanced microelectronics characterization.

Strain engineering—deliberately stretching or compressing a crystal lattice—is used in advanced microelectronics to accelerate electron flow. Even a fraction of a percent change in lattice spacing can produce faster, more power-efficient processors. CEA-Leti has therefore developed local quantitative material-deformation measurement and now offers a strain-mapping service built on transmission electron microscopy (TEM) with precession electron diffraction (PED). Conventional electron diffraction uses a fixed beam angle and often yields complex patterns due to dynamic scattering; PED instead rotates the beam in a conical sweep, recording a cleaner, more complete diffraction pattern over dozens of orientations.

Workflow starts with roughly 80 nm-thick lamellae prepared by focused ion beam (FIB) milling, inserted into a PED-equipped TEM. Scanning diffraction then measures crystal lattice parameters with high spatial resolution across device regions. The resulting strain maps achieve 1 nm spatial resolution and ~0.02% precision, placing CEA-Leti among the world's leaders in nanoscale metrology. The process has been simplified and accelerated for higher throughput and faster turnaround. Three TEMs are now equipped for PED, increasing sample capacity and making the service accessible to more qualified microscopists. Bernier highlights the combined fundamental research and application-driven engineering expertise that turned an experimental methodology into a practical, routine characterization service.

Résumé
Le CEA-Leti propose un service de cartographie des déformations à l’échelle nanométrique fondé sur la diffraction électronique en précession (PED) sous microscopie électronique en transmission, avec une résolution spatiale de 1 nm et une précision d’environ 0,02 %. Trois TEM sont désormais équipés pour ces mesures, ce qui accroît le débit et raccourcit les délais de caractérisation pour les industriels. Cette avancée en métrologie, portée notamment par Bernier et son équipe, soutient l’ingénierie des contraintes pour améliorer la vitesse et l’efficacité énergétique des processeurs.

​​​​​​The performance of advanced microelectronic devices depends especially on the efficient transport of electrical charges. These transport properties are strongly related to deformation of the crystal lattice.

Strain engineering, which involves deliberately stretching or compressing a crystal lattice, is used to boost the speed of electron flow in a device. Even a fraction of percent change in lattice spacing can translate into faster and more power-efficient processors. That is why at CEA-Leti we have been working in recent years on the local and quantitative measurement of material deformations, which are at the heart of today’s cutting-edge devices.​​​​

CEA‑Leti's strain‑mapping service uses transmission electron microscopy (TEM) to carry out precession electron diffraction (PED). In ordinary electron diffraction the beam hits the crystal at a fixed angle, often producing complex patterns because of dynamic scattering. PED solves that by rotating the beam in a conical sweep, recording a more complete diffraction pattern over dozens of orientations. The result is higher-quality diffraction data that can be turned into strain maps.

The workflow starts with ultra‑thin lamellae—cross‑sections of a chip that are roughly 80 nm thick— prepared using focused ion beam (FIB) milling.

Once the specimen is ready, it is inserted into a TEM microscope equipped with a PED module. Scanning diffraction allows the lab to measure the lattice parameters of the crystal with high spatial resolution in different regions of a device.

The technique delivers strain maps with 1 nm spatial resolution and ~ 0.02 % precision, which places CEA-Leti among the world's leaders in nanoscale metrology.

The technique has been simplified and accelerated where possible to enable higher throughput and make better use of the instruments. The result is a faster turnaround time for characterization requests.

Three TEMs are now equipped to perform PED measurements, allowing CEA-Leti to handle a larger volume of samples and making the service accessible to more qualified microscopists.

The project didn't happen in isolation. Bernier​​ emphasizes the combined expertise of the team members that made it possible:

That partnership between fundamental research and application‑driven engineering helped turn an experimental methodology into a practical, routine characterization service. ​

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