FAMES-SiNANO 研究院研讨会

Workshop FAMES-SiNANO Institute

CEA-Leti Quality unknown · 质量未知 Original
摘要
FAMES与SiNANO Institute将于2026年9月7日在西班牙马略卡岛帕尔马举办半日工作坊“FD-SOI Pilot Line Insights and Perspective”，首次深入发布其FAMES试验线在10nm与7nm FD-SOI技术开发方面的技术成果。与此同时，CEA-Leti参加2026年Semicon Taiwan并在“Choose France”展台展示最新半导体进展，现场还将就异构集成相关论文与业界交流；其光子学团队同步展示硅光子、µLED及先进封装的光数据传输成果。另据悉，CEA-Leti还受邀在瑞士因特拉肯组织半导体可持续与生命周期评估（LCA）教程（第二届），由PSI项目主席Helmut Schift牵头，邀请多所高校与CEA-Leti专家授课，推动行业在环境足迹评估与低碳实践上的落地。

2026年9月7日，FAMES 与 SiNANO Institute 将在西班牙帕尔马-德马略卡举办一场半天专题研讨会，主题为“FD-SOI Pilot Line Insights and Perspective”。这将是首次系统披露 FAMES Pilot Line 在 10 nm 和 7 nm FD-SOI 技术开发方面的深入技术成果。相关咨询可联系 contact@fames-pilot-line.eu。

与此同时，CEA-Leti 也在台湾台北南港展览馆 TaiNEX 1 & 2 参加 SEMICON Taiwan 2026，重点展示其在半导体技术方面的最新进展，并强调其长期以来与台湾及全球半导体生态系统在科研和产业合作上的承诺。作为 Choose France Pavilion 的一部分，CEA-Leti 也借此推动法国在技术研究、创新与技术转移方面的实力。

在学术交流方面，ESSERC 的目标是为欧洲固态器件与电路领域提供一个年度论坛，用于展示和讨论最新进展。随着系统级芯片（system-on-chip）集成度持续提升，这一趋势得益于半导体技术的进步，也使得工艺技术人员、器件专家、IC 设计师和系统设计师之间的更深层次协作变得比以往任何时候都更重要。

在 SEMICON Taiwan 期间，CEA-Leti 专家将驻守展台，并就三篇关于异构集成（heterogeneous integration）的论文成果进行交流。此外，CEA-Leti 的光学与光子学跨学科团队还将介绍其在硅光子学光数据传输、µLED 以及先进封装解决方案方面的最新结果。

在瑞士因特拉肯，CEA-Leti 受 PSI 研究所程序主席 Helmut Schift 邀请，组织一场关于半导体行业可持续发展与生命周期评估（life cycle assessment, LCA）的教程。这是继 2024 年在蒙彼利埃、庆祝 CEA-Leti 50 周年期间举办的首届教程之后的第二届。该全天教程旨在培训工程师和青年研究人员，帮助他们评估半导体产业的环境足迹，并在生态责任导向下采用可持续实践。课程将通过实际案例展开，涵盖资源优化、温室气体（GHG）排放和能耗降低，以及电子元件韧性等议题。

授课专家包括：英国格拉斯哥大学的 Jeff Kettle、比利时 UCL 的 Sébastien Toussaint、瑞士 EPFL 的 Cyrille Hibert，以及来自法国 CEA-Leti 的 Isabelle Servin 和 Yannick Rivoira。

Summary
FAMES and the SiNANO Institute will host a half-day workshop in Palma de Mallorca on 7 September 2026, “FD-SOI Pilot Line Insights and Perspective,” offering the first in-depth technical results from FAMES’ pilot line targeting 10 nm and 7 nm FD-SOI technologies. In parallel, CEA-Leti is participating in SEMICON Taiwan 2026 (Choose France Pavilion) and will discuss advances including heterogeneous integration, silicon photonics/µLED and advanced packaging, while also organizing a full-day sustainability tutorial in Interlaken led by Helmut Schift (PSI) with contributions from multiple European academic and CEA-Leti experts. Together, these events underscore near-term progress in advanced FD-SOI scaling and broader semiconductor ecosystem collaboration, plus growing focus on lifecycle assessment and eco-responsible manufacturing practices.

FAMES and the SiNANO Institute will hold a half-day workshop on 7 September 2026 in Palma de Mallorca, Spain, titled “FD-SOI Pilot Line Insights and Perspective.” The session will mark the first in-depth public presentation of technical results from the FAMES Pilot Line, focusing on the development of 10 nm and 7 nm FD-SOI technologies. Questions can be directed to contact@fames-pilot-line.eu.

In parallel, CEA-Leti is taking part in SEMICON Taiwan 2026 at TaiNEX 1 & 2, Taipei Nangang Exhibition Center, Taipei, Taiwan, where it is showcasing its latest semiconductor advances and reaffirming its long-term commitment to scientific and industrial cooperation with Taiwan and the wider semiconductor ecosystem. As part of the Choose France Pavilion, the institute is also promoting French strengths in technology research, innovation and technology transfer.

CEA-Leti experts will be present at the booth to discuss findings from three papers on heterogeneous integration. The institute’s Optics and Photonics teams are also presenting recent work on optical data transmission, including developments in silicon photonics, µLEDs and advanced packaging solutions.

Separately, CEA-Leti has been invited by Helmut Schift of the PSI Institute to organize a full-day tutorial in Interlaken, Switzerland, on sustainability in the semiconductor industry and life cycle assessment. This will be the second edition of the tutorial, following the first one held in Montpellier in 2024 during the institute’s 50th anniversary celebrations.

The tutorial is designed to train engineers and young researchers in assessing environmental impact through life cycle assessment (LCA) and in adopting more sustainable semiconductor practices based on an eco-responsible approach. Topics will include resource optimization, greenhouse gas emissions, energy consumption reduction, and the resilience of electronic components. Speakers will include Jeff Kettle (University of Glasgow, UK), Sébastien Toussaint (UCL, Belgium), Cyrille Hibert (EPFL, Switzerland), and Isabelle Servin and Yannick Rivoira from CEA-Leti, France.

Résumé
Le 7 septembre 2026, FAMES et l’institut SiNANO organisent à Palma de Majorque un atelier d’une demi-journée consacré aux enseignements de la “FD-SOI Pilot Line”, avec la présentation de résultats techniques approfondis sur le développement des nœuds 10 nm et 7 nm en FD-SOI. Par ailleurs, CEA-Leti participe à SEMICON Taiwan 2026 (pavillon Choose France) et met en avant ses avancées en semi-conducteurs, notamment via des discussions sur l’intégration hétérogène et des démonstrations en transmission optique (silicon photonics, µLED et packaging avancé). Enfin, CEA-Leti organise en Suisse un tutoriel (2e édition) sur la durabilité dans l’industrie des semi-conducteurs et l’analyse du cycle de vie, avec des intervenants académiques et de CEA-Leti, visant à former ingénieurs et jeunes chercheurs à des pratiques éco-responsables.

The 9/7/2026Palma de Mallorca, Spain

On7 September 2026, FAMES and the SiNANO Institute will host a dedicated half-day workshop entitled:“FD-SOI Pilot Line Insights and Perspective”

This session will be the first opportunity to present in-depth technical results from the FAMES Pilot Line on the development of10 nm and 7 nm FD-SOI technologies.

Contact:contact@fames-pilot-line.euwith any questions.​

Event|TaiNEX 1 & 2 – Taipei Nangang Exhibition Center, Taipei, Taiwan

CEA-Leti is participating in SEMICON Taiwan 2026, highlighting its latest advances in semiconductor technologies and reinforcing its long-standing commitment to scientific and industrial cooperation with Taiwan and the global semiconductor ecosystem. As part of the Choose France Pavilion, CEA-Leti contributes to promoting French excellence in technology research, innovation and technology transfer.

The aim of ESSERC is to provide an annual European forum for the presentation and discussion of recent advances in solid-state devices and circuits. The level of integration for system-on-chip design is rapidly increasing. This is made available by advances in semiconductor technology. Therefore, more than ever before, a deeper interaction among technologists, device experts, IC designers and system designers is necessary.

CEA-Leti experts will be onsite at CEA-Leti's booth and available to discuss the findings of three papers on heterogeneous integration

CEA-Leti's Optics and Photonics multidisciplinary teams introduced their latest results on optical data transmissions with silicon photonics, µLED & advanced packaging solutions.

Event | Agenda|Interlaken, Switzerland

CEA-Leti has the honour to be invited to organize a Tutorial on sustainability in semiconductor industry and life cycle assement by the Program Chair, Helmut Schift from PSI institute. It will the second edition after the tutorial held in Montpellier in 2024 during the celebration of 50th anniversary.

This full-day tutorial objective is to train engineers and young researchers both in assessing the environmental footprint assessing (LCA) and adopting sustainable practices in semiconductor industry based on eco-responsible approach. We will illustrate this using practical case studies, ranging from resource optimisation, greenhouse gas (GHG) emissions or energy consumption reduction to the resilience of electronic components.

Lecturers- experts in their field will be speaking : ; Jeff Kettle, University of Glasgow, United Kingdom;Sébastien Toussaint, UCL, Belgium; Cyrille Hibert, EPFL, Switzerland, Isabelle Servin and Yannick Rivoira, CEA-Leti, France

AI Insight
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Core Point

FAMES与SiNANO在西班牙马略卡举办“FD-SOI Pilot Line”半日研讨，首次披露其10nm/7nm FD-SOI技术的深度成果；同时CEA-Leti在台北SEMICON Taiwan 2026与欧洲固态器件论坛、瑞士组织半日/全日可持续研讨，推动FD-SOI与异构集成及可持续半导体议题的产业交流。

Key Players

FAMES — FD-SOI试产线相关技术方，欧洲（总部/基地未在文中明确）。

SiNANO Institute — 半导体/纳米技术研究与产业协作机构，西班牙（活动在马略卡）。

CEA-Leti — 半导体研发与技术转移机构，法国（在台北、瑞士组织活动并参会）。

PSI（Paul Scherrer Institute） — 组织可持续研讨项目相关方，瑞士。

UCL / EPFL / EPFL等高校与研究者 — 可持续与LCA/半导体环境影响相关讲师团队（比利时/瑞士等）。

Industry Impact
  • Computing/AI: Medium — FD-SOI工艺与先进封装/异构集成提升芯片性能与能效潜力。
  • ICT: Medium — 半导体器件与电路进展、异构集成讨论促进产业落地。
  • Energy: Medium — 可持续研讨聚焦LCA、能耗与GHG减排，影响制造与供应链策略。
  • Terminals/Consumer Electronics: Low — µLED与先进封装/光子学成果可能延伸到显示与终端，但本次偏研发交流。
Tracking

[Monitor] — FD-SOI 10nm/7nm试产线披露与异构集成/可持续路线可能影响后续工艺与产业合作节奏。

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AI Processing
2026-09-03 23:02
openai / gpt-5.4-nano