Wooptix installe son système de métrologie des wafers au CEA-Leti
西班牙半导体计量创新企业Wooptix宣布，其Phemet晶圆计量系统已在法国格勒诺布尔的CEA-Leti研究所完成首次工业部署。这是该系统从实验室走向实际应用的关键一步。
Phemet系统专为硅晶圆的形状与几何参数测量而设计，具备超高速采集能力，并能实现亚纳米级的分辨率。此次安装旨在帮助CEA-Leti更深入地分析和理解半导体制造工艺中的细微变化，从而优化制程控制。
Wooptix总部位于西班牙，其核心技术为一种应用于半导体领域的创新计量方法。在CEA-Leti落地的这套设备，标志着该公司技术成熟度迈入新阶段，也为先进制程研发提供了更高精度的量测工具。
Wooptix, the Spanish semiconductor metrology specialist, has completed the first industrial deployment of its Phemet system at CEA-Leti in Grenoble, France. The installation marks a significant step for the company’s proprietary technology, which leverages wavefront phase imaging to deliver wafer shape and geometry measurements with subnanometric resolution at unprecedented speed.
The Phemet platform is engineered to characterize whole silicon wafers—capturing topography, bow, warp, and nanotopography—in a single snapshot acquisition. This eliminates the throughput bottlenecks of traditional scanning interferometry, enabling inline process control and rapid feedback for advanced semiconductor nodes. At CEA-Leti, the system will support research into process optimization and defect root-causing across 200 mm and 300 mm wafer formats.
During a joint inauguration, Wooptix CEO Javier Elizalde said the collaboration with Leti “validates the industrial readiness of our wavefront metrology,” while Leti’s director of silicon technologies, Olivier Faynot, emphasized the system’s potential to “accelerate learning cycles on next-generation devices by correlating geometry anomalies with process parameters in near real time.”
Key technical specifications cited by Wooptix include a lateral resolution down to 42 µm and vertical repeatability below 0.3 nm, with total measurement time of under one second per wafer. The non-contact optical method avoids contamination risks and mechanical stress, making it suited for delicate advanced substrates including SOI, SiC, and glass carriers.
The deployment follows Wooptix’s earlier collaborations with European semiconductor equipment manufacturers and is part of a broader push to embed its metrology into both R&D fabs and high-volume manufacturing environments. The company expects the CEA-Leti installation to generate reference data that will inform future tool iterations and support adoption by memory and logic chipmakers grappling with tighter process windows at 3 nm and below.
Premier déploiement industriel du système de métrologie Phemet de l’Espagnol Wooptix, cette installation promet des mesures ultrarapides et à résolution subnanométrique de la forme et de la géométrie des tranches de silicium en vue d’approfondir la compréhension des procédés. Wooptix, société espagnole à l’origine d’une technologie de métrologie innovante appliquée aux semi-conducteurs, a annoncé l’installation […]
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Wooptix’s Phemet wafer metrology system, promising ultra-fast, sub-nanometer shape and geometry measurements, saw its first industrial deployment at CEA-Leti to deepen semiconductor process understanding.
Monitor — first industrial use of a novel technology; watch for validation results and broader adoption in semiconductor fabs.